Fundamentals of silicon integrated device technology volume 1 : oxidation, diffusion and epitaxy

Fundamentals of silicon integrated device technology volume 1 : oxidation, diffusion and epitaxy edited by R. M. Burger, R. P. Donovan - New Jersey Prentice-Hall Inc. 1967 - xiv, 495 s. res., graf. 24 cm. - Prentice-Hall, Inc. Electrical engineering series Solid state physical electronics series .

İndeks var.


Microelectronics.
Silicon.

621.381 FUN 1967

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